Tungsten Powder Granularity Effect on Tungsten copper electrode
Since the high strength, excellent thermal and electrical
conductivity and arc erosion resistance, tungsten copper has been becoming the
one of the important materials for electrode application. There are many
influencing factors of tungsten copper electrode materials, but the vast
majority of literature can consult to affect mostly concentrated in the preparation
process (tungsten skeleton, density, hardness, uniformity) of tungsten copper
electrode material. We introduce the effect of tungsten powder granularity on
tungsten copper electrode. Viewed from the distribution and structure, tungsten
copper with the same composition, the finer particle size of tungsten will
distribute more uniformly. But the possibility of closed-pore and defects
appearing is also increasing, Cu enrichment increasing and the overall
uniformity decreasing.
For the aspect of the
hardness and the density, with the increasing of powder granularity, the pressing
density and degreasing density of the tungsten skeleton fabricated by different
granularity of tungsten powder is basically the same, and the overall density
of tungsten copper also decreased after the infiltration. Take tungsten copper
W-30Cu as example, When the tungsten powder particle size of 2.65μm, the
highest hardness, Brinell hardness up to 222HB. With the powder size increases,
the hardness decreases when the tungsten powder particle size of 8μm minimum
hardness, Brinell hardness is 190HB. This is due to the higher density brings
the greater brittleness. The powder granularity decreases, the specific surface
area increases, the higher surface energy, the greater sintering activity and
the more obvious volume shrinkage after sintering, which increases the content
of W, improves the overall density and hardness. In the electrical
conductivity, tungsten powder particle size of the smaller and more easily when
pressed cause tissue inhomogeneity of skeleton sintered in the passage is
closed and prone to clogging, thus resulting in voids or defects in copper-rich
material and cause copper deficiency or liquid infiltration feeding can not
effectively reduce the integrity of the copper network grid after infiltration,
so that the electrical conductivity decreased.
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