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2017年1月18日星期三

Infiltration Time Effect on Tungsten Copper Electrode Properties

Take W-Cu tungsten copper electrode as an example, with increasing infiltration time, the density of tungsten copper electrode increases. And after that the infiltration density reaches the maximum, the density of tungsten copper electrode decreases by the time. The density and hardness of tungsten copper W-25Cu in different infiltration time as follow:
In the process of infiltration, copper solution completely infiltrated tungsten skeleton will take some time, with the increasing infiltration time, tungsten skeleton has infiltrated more fully, the corresponding density of tungsten copper electrode was improved. However, when tungsten skeleton was completely infiltrated by copper solution, if the temperature continues to increase the infiltration density changed a little longer this time but likely to cause the liquid copper tungsten particle erosion, some places inside may appear copper pool, which decrease the density of tungsten copper electrode.In addition, due to the diffusion of crystal grains, the odds of the liquid copper into the tungsten particles increases, the lattice stress decreases, and the tungsten particles are rearranged so that the partial so that the construction is more uniform. Viewed from the cost, it is useless to increase infiltration time.

In the early of infiltration, tungsten skeleton was not completely infiltrated by copper solution, which lack of density and hardness. However, the infiltration has become more and more fully as time goes by so that the density and hardness of tungsten copper electrode will rise. But when infiltration is completely and time continue to increase, it may lead tungsten particle to grow up and evaporated tungsten particles in liquid copper, which makes tissue distribution is uneven, the hardness decreased accordingly. Except that the density and hardness of tungsten copper electrode, the electrical conductivity is also an crucial property when it used as electrode in EDM or ECM.

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