As the speed and degree of integration of semiconductor
devices increases, more heat is generated, and the performance and lifetime of
semiconductor devices depend on the dissipation of the generated heat.
Tungsten copper alloys have high electrical and thermal conductivity, low contact resistances, and low coefficients of thermal expansion, thus allowing
them to be used as a shielding material for microwave packages, and heat sinks
for high power integrated circuits (ICs). In this study, the thermal
conductivity and thermal expansion of several types of tungsten–copper (W–Cu)
composites are investigated, using compositions of 5–30 wt.% copper
balanced with tungsten. The tungsten–copper powders were produced using the spray
conversion method, and the W–Cu alloys were fabricated via the metal injection
molding. The tungsten–copper composite particles were nanosized, and the
thermal conductivity of the W–Cu alloys gradually decreases with temperature
increases. The thermal conductivity of the W–30 wt. % Cu composite was
238 W/(m K) at room temperature.
We present the temperature dependence of the thermophysical
properties for tungsten–copper composite from room temperature to 400 °C.
The powders of tungsten–copper were produced by the spray conversion method and
the W–Cu alloys were fabricated by the metal injection molding. Thermal
conductivity and thermal expansion of tungsten–copper composite was
controllable by volume fraction copper.
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